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Business Areas
Semiconductors/LCD Lithography Equipment
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Semiconductor and LCD lithography equipment has become essential for world industries. Because semiconductor lithography equipment is used for printing minute circuits on semiconductors, which are key devices supporting the information-oriented society. LCD lithography equipment is used for printing minute circuits on LCD panels incorporated in LCD television which are popularizing rapidly at home. |
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Based on the original high precision surface processing/multi-layer thin film coating technology enhanced by the longtime experience, NITTO OPTICAL has produced various optical parts (high precision prisms, long bar mirrors, corner cube prisms, etc.). Those optics are used for EB (electron beam) lithography equipment which produces tininess masks, for SEM (Scanning Electron Microscope) which analyzes and measures semiconductor defects, and for the mechanisms of stage and illumination of semiconductor/LCD lithography equipment. For LCD lithography equipment, over 3,000mm ultra long bar mirrors can be produced. |
Examples of Products for Semiconductors/LCD Lithography Equipment
Products | Examples of Applications | ||
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Prisms | Corner Cube Prisms (CCP) | Semiconductors/LCD Lithography Equipment |
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Triangular Prisms | |||
Beam Shaping Prisms (Littrow Prism) |
Semiconductors/LCD Lithography Equipment |
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Wedge Prisms | Semiconductors/LCD Lithography Equipment |
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Polarizers/ Polarizing Prisms | Beam Splitters | EUV Band Beam Splitter | Semiconductors/LCD Lithography Equipment |
Polarizing Beam Splitter | Semiconductors/LCD Lithography Equipment |
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Non-polarizing Beam Splitters | |||
Wave Plates (λ/2, λ/4) | Semiconductors/LCD Lithography Equipment |
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Mirrors | Bar Mirrors | Ultra Long Bar Mirror | Semiconductors/LCD Lithography Equipment |
Ultra Low Expansion Glass-ceramic Bar Mirror | |||
Quartz Bar Mirror | |||
Ceramics Bar Mirror | |||
SiC Ceramic Bar Mirror | |||
L-shaped Mirrors | |||
Thin Film Coatings | Reflecting Mirrors | Multi-layer Reflection Mirror | Semiconductors/LCD Lithography Equipment, EUVL reflective optical systems for R&D |
Total Reflection Mirror | Semiconductors/LCD Lithography Equipment |
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Laser Mirrors | Multi-layer Mirror for Excimer Laser | Semiconductors/LCD Lithography Equipment |
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AR Coatings | AR Coating for Excimer Lasers | Semiconductors/LCD Lithography Equipment |
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Half Mirrors | Semiconductors/LCD Lithography Equipment |
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Attenuators | Semiconductors/LCD Lithography Equipment |
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Others | Etalons | Fabry-perot Etalon | Semiconductors/LCD Lithography Equipment |
Solid Etalon | |||
Mask Blanks | Substrate for EUV Mask Blanks | Semiconductors/LCD Lithography Equipment |
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CaF2(Calcium Fluoride) Optical Elements | CaF2 Window (Window Material) |
Semiconductors/LCD Lithography Equipment |
Semiconductors/
LCD Lithography Equipment