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Semiconductors/LCD Lithography Equipment

Semiconductors/LCD Lithography Equipment

Semiconductor and LCD lithography equipment has become essential for world industries. Because semiconductor lithography equipment is used for printing minute circuits on semiconductors, which are key devices supporting the information-oriented society. LCD lithography equipment is used for printing minute circuits on LCD panels incorporated in LCD television which are popularizing rapidly at home.

The minute exposure technology of semiconductor lithography equipment (stepper) has evolved in particular to g-line, i-line and excimer laser (KrF/ArF) steppers. Furthermore, EUVL (Extreme Ultra Violet Lithography), which is super minute exposure technology, has been developed as the next generation lithography.
As for lithography equipment for LCD displays, panel size has been enlarged to 6th, 7th, 8th and the next generation.

Based on the original high precision surface processing/multi-layer thin film coating technology enhanced by the longtime experience, NITTO OPTICAL has produced various optical parts (high precision prisms, long bar mirrors, corner cube prisms, etc.). Those optics are used for EB (electron beam) lithography equipment which produces tininess masks, for SEM (Scanning Electron Microscope) which analyzes and measures semiconductor defects, and for the mechanisms of stage and illumination of semiconductor/LCD lithography equipment. For LCD lithography equipment, over 3,000mm ultra long bar mirrors can be produced.
In addition, various optical materials such as glass or ceramics can be selected for bar mirrors depending on customers requirements.

Examples of Products for Semiconductors/LCD Lithography Equipment

  Products Examples of Applications
Prisms Corner Cube Prisms (CCP) Semiconductors/LCD
Lithography Equipment
Triangular Prisms
Beam Shaping Prisms
(Littrow Prism)
Semiconductors/LCD
Lithography Equipment
Wedge Prisms Semiconductors/LCD
Lithography Equipment
Polarizers/ Polarizing Prisms Beam Splitters EUV Band Beam Splitter Semiconductors/LCD
Lithography Equipment
Polarizing Beam Splitter Semiconductors/LCD
Lithography Equipment
Non-polarizing Beam Splitters
Wave Plates (λ/2, λ/4) Semiconductors/LCD
Lithography Equipment
Mirrors Bar Mirrors Ultra Long Bar Mirror Semiconductors/LCD
Lithography Equipment
Ultra Low Expansion Glass-ceramic Bar Mirror
Quartz Bar Mirror
Ceramics Bar Mirror
SiC Ceramic Bar Mirror
L-shaped Mirrors
Thin Film Coatings Reflecting Mirrors Multi-layer Reflection Mirror Semiconductors/LCD
Lithography Equipment,
EUVL reflective optical
systems for R&D
Total Reflection Mirror Semiconductors/LCD
Lithography Equipment
Laser Mirrors Multi-layer Mirror for Excimer Laser Semiconductors/LCD
Lithography Equipment
AR Coatings AR Coating for Excimer Lasers Semiconductors/LCD
Lithography Equipment
Half Mirrors Semiconductors/LCD
Lithography Equipment
Attenuators Semiconductors/LCD
Lithography Equipment
Others Etalons Fabry-perot Etalon Semiconductors/LCD
Lithography Equipment
Solid Etalon
Mask Blanks Substrate for EUV Mask Blanks Semiconductors/LCD
Lithography Equipment
CaF2(Calcium Fluoride) Optical Elements CaF2 Window
(Window Material)
Semiconductors/LCD
Lithography Equipment




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