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Photo Etching

Grating by photo etching technology

Photo Etching is a technique for making patterns by etching the film from coated substrates such as glass, and it is used for grating, etc.

Grating (diffraction grating) is an element that disperses beam without using prisms Dielectric films such as aluminum or SiO2 are exposed, accumulated in layers on glass substrate which has minute slits. When beam is transmitted, it causes a diffraction phenomena and beam is dispersed. Demultiplexed beam causes the central 0 order diffraction and ±1 diffraction - multiple order diffraction from the central. The spectral characteristics depend on the width and depth of the slits.

The patterning accuracy is related to photo etching. Recently, miniaturization and high specifications are increasingly required.
NITTO OPTICAL provides line and space 3μm order patterning by new technology in lithography and etching (dry etching, wet etching).

 

Photo Etching



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