Mirrors

Bar Mirrors

Bar Mirrors are used for the control system in the X-Y stage of lithography equipment. The performance of the X-Y stage determines the required accuracy for the bar mirror. High-precision Bar mirrors show excellent performance. NITTO OPTICAL provides bar mirrors in various sizes and wide selection of materials such as ceramics.
NITTO OPTICAL guarantees the surface flatness below λ using the ZYGO 32″(Φ800) Interferometer and the ZYGO 12″ (Φ300) Interferometer.

Size: from 100mm to over 3,500mm.
Surface Flatness from several μm level to λ or less.
Please contact us for details about specifications. (Materials, Shape, Surface Flatness, etc.)

Applications
  • Semiconductors/LCD Lithography Equipment

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Ultra Long Bar Mirror

Nitto Optical is capable of processing ultra long bar mirrors over 3,000 mm in length.
We have established a system to realize the processing of special-sized bar mirrors while maintaining high precision and stable quality.
We are also continuously developing technologies for even longer sizes to further enhance our capability to meet customer needs.

Applications
  • Semiconductors/LCD Lithography Equipment

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Ultra Low Expansion Glass-ceramic Bar Mirror

Ultra Low Expansion Glass-ceramic bar mirror has extremely small dimensional change against temperature variation, enabling precise control of optical stages.

Applications
  • Semiconductors/LCD Lithography Equipment

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Polishing Characteristics

Quartz Bar Mirror

Quartz Bar Mirrors are used for precise control of stages in exposure and inspection equipment.

Applications
  • Semiconductors/LCD Lithography Equipment

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Polishing Characteristics Data

Ceramics Bar Mirror

Ceramics Bar Mirrors use materials with high rigidity and low thermal expansion, enabling precise control of stages in exposure and inspection equipment while minimizing deformation caused by temperature changes and self-weight.

Applications
  • Semiconductors/LCD Lithography Equipment

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Polishing Characteristics Data

SiC Ceramic Bar Mirror

SiC Ceramic Bar Mirrors take advantage of high hardness, high thermal conductivity, low thermal expansion, and light weight, enabling precise control of stages in exposure and inspection equipment.

Applications
  • Semiconductors/LCD Lithography Equipment

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L-shaped Mirrors

L-shaped Mirrors contribute to high-precision measurement with accurate perpendicularity, and the integrated product structure facilitates easy incorporation into equipment.

Applications
  • Semiconductors/LCD Lithography Equipment

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Polishing Characteristics Data

Polygon Mirrors

Polygon Mirrors are rotating polyhedron mirrors with flat reflecting surfaces on the perimeter.

Applications
  • Laser Printers

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Ring Laser Gyroscope Mirrors

Ring laser gyroscopes are widely used in inertial navigation systems for aircraft, rockets, and ships.
The mirrors used in Ring Laser Gyroscopes require high reflectivity and low loss performance.

Applications
  • Aviation/Aerospace (Aircraft, Ships, Rockets)

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Low Scattering Mirrors

Low Scattering Mirrors achieve low loss and high reflectivity through ion beam sputtering (IBS) technology.

Applications
  • Aviation/Aerospace (Aircraft, Ships, Rockets)

EUV Mirrors

EUV Mirror is an optical element with a multilayer structure specialized for reflection of extreme ultraviolet (EUV, wavelength about 13.5 nm).
By alternately stacking materials such as molybdenum (Mo) and silicon (Si), the reflectance for a specific wavelength is maximized.

Applications
  • Semiconductors/LCD Lithography Equipment

Spectral Characteristics

Freeform Mirrors

Freeform mirror is a reflective optical element with a complex surface shape that does not have rotational symmetry, and it is a high-performance mirror that can correct multiple aberrations simultaneously.
It enables optical control that is difficult with conventional spherical and aspherical mirrors.

Applications
  • Medical Equipment
  • Semiconductors/LCD Lithography Equipment
  • Survey Equipment
  • Measuring Instruments
  • Projectors

Silicon Mirrors

Silicon mirror is a mirror with an Si substrate surface polished to be extremely smooth, used for X-ray reflection.
It has high figure accuracy and thermal conductivity, making it useful in high-energy range.
It is used in synchrotron radiation facilities for the purpose of precise focusing.

Applications
  • Semiconductors/LCD Lithography Equipment
  • Others (e.g., Synchrotron Radiation Facility )

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